Category: Products

The chemical formula of xenon is kr, which is a natural noble gas with the largest relative atomic mass and

Tungsten hexafluoride (WF6): Employed as a precursor gas in the deposition of tungsten films for semiconductor manufacturing and in the

Trimethylboron (B(CH3)3): Used as a precursor in chemical vapor deposition (CVD) processes for the deposition of boron-containing thin films. Purity:99%

Trichlorosilane (SiHCl3): Primary precursor for the production of ultra-pure silicon for semiconductor manufacturing. Purity:99.9%

Sulfur hexafluoride (SF6): Widely used as an electrical insulator in high-voltage applications, as a dielectric gas in switchgear, and in

Sulfur dioxide is a colorless gas at room temperature with a pungent odor. It has strong permeability, can penetrate into

Silicon tetrafluoride (SiF4): Used in the production of silicon for semiconductor manufacturing and as a fluorinating agent in organic synthesis.

Silicon tetrachloride (SiCl4): Employed in the production of silicon for semiconductor manufacturing and in the synthesis of organosilicon compounds. Purity

Silanes are compounds of silicon and hydrogen, including monosilane (SiH4), disilane (Si2H6), and some higher-order silicon-hydrogen compounds. Among them, monosilane

Phosphine (PH3): Utilized in the semiconductor industry for the deposition of compound semiconductors and in the production of certain chemicals.