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Nitrogen trifluoride (NF3): Used in the semiconductor industry as a cleaning gas for chemical vapor deposition (CVD) chambers. Purity:99.99%
Neon is a colorless, odorless and odorless gas. It is gaseous at room temperature and is an inert gas. Its
Methylsilane (CH3SiH3): Used as a precursor gas in the deposition of silicon films in semiconductor manufacturing. Purity:99.99%
Krypton is a colorless, odorless and tasteless gas. The boiling point is -153.35℃, and the content of krypton in the
Hydrogen fluoride (HF): Widely used in the semiconductor industry for etching silicon dioxide and other materials. Purity:99.99%
Hydrogen bromide (HBr): Used in various organic synthesis reactions and as a catalyst in certain chemical processes. Purity :5N
Halocarbon c318,C4F8, also known as octafluorocyclobutane, is a colorless, odorless, nonflammable gas composed of carbon and fluorine atoms. It is
Halocarbon 218 (C3F8): Primarily used as a refrigerant in low-temperature applications and as a propellant in aerosol cans. Purity ranges
Halocarbon 116 (C2F6): Used in plasma etching processes in the semiconductor industry and as a refrigerant. Purity : 99.99%.
Halocarbon 32 (CH2F2): Commonly used as a refrigerant and as a precursor in the production of fluoropolymers. Purity:99.9%
Argon is one of the most common carrier gases in gas chromatography. Argon is used as a carrier gas in
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