Category: Products

Halocarbon 23 (CHF3): Used as a cleaning gas in the semiconductor industry and as a refrigerant. Purity ranges typically from

Halocarbon 14 (CF4): Widely used as a plasma etching gas in the semiconductor industry and as a refrigerant. Purity: 99.999%.

Germane (GeH4): Used in the production of semiconductors, particularly for the deposition of germanium films. Purity: 99.999%

Disilane(SiH3)2: Primarily used in the semiconductor industry for epitaxial growth of silicon layers. Purity :99.999%.

Dichlorosilane (SiH2Cl2): Used in the production of semiconductor materials and as a precursor for silicon deposition in chemical vapor deposition

Diborane is a chemical compound that consists of boron and hydrogen atoms and has a molecular formula B2H6. This substance

The chemical formula of chlorine is Cl2, which is a toxic gas. It is mainly used in high-tech fields such

Boron Trifluoride, BF3, is a colourless, toxic, nonflammable, corrosive, high-pressure gas.   Applications In the semiconductor industry, boron trifluoride is

Boron trichloride.BCl₃ is the main gas composition in High-K and metal anisotropic plasma etch. Atomic layer etch and pulsed plasma

Ammonia, a kind of inorganic substance with chemical formula of NH3 and molecular weight of 17.031, is colorless and has