Halocarbon c318，C4F8, also known as octafluorocyclobutane, is a colorless, odorless, nonflammable gas composed of carbon and fluorine atoms. It is commonly used in various industrial applications due to its unique properties.C4F8 plays a crucial role in the semiconductor industry and other advanced manufacturing sectors where precise and controlled etching and deposition processes are required.

Applications:

Etching Gas: C4F8 is widely utilized as an etching gas in the semiconductor industry, particularly for plasma etching processes. It is highly effective for etching silicon dioxide (SiO2) and silicon nitride (Si3N4) films during the fabrication of integrated circuits.

Chemical Vapor Deposition (CVD): C4F8 is employed as a precursor gas in chemical vapor deposition processes for depositing fluorinated polymer thin films. These films find applications in protective coatings, surface modification, and nanotechnology.

Heat Transfer Fluid: Due to its excellent thermal stability and low viscosity, C4F8 is sometimes used as a heat transfer fluid in specialized applications such as electronics cooling systems and semiconductor manufacturing equipment.

Purity: 99.99%